Revolutionary and evolutionary resist design concepts for 193 nm lithography
- 28 February 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 35 (1-4) , 133-136
- https://doi.org/10.1016/s0167-9317(96)00172-4
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Materials Design Considerations for Future Lithographic Technologies.Journal of Photopolymer Science and Technology, 1995
- All Dry Lithography: Applications of Plasma Polymerized Methylsilane as aSingle Layer Resist and Silicon Dioxide Precursor.Journal of Photopolymer Science and Technology, 1995
- Acid-catalyzed single-layer resists for ArF lithographyOptical Engineering, 1993
- Dry Etch Resistance of Organic MaterialsJournal of the Electrochemical Society, 1983