A Monolayer-Based Lift-Off Process for Patterning Chemical Vapor Deposition Copper Thin Films
- 1 January 1996
- journal article
- research article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 12 (22) , 5350-5355
- https://doi.org/10.1021/la960377b
Abstract
No abstract availableKeywords
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