A new method of reducing dislocation density in GaN layer grown on sapphire substrate by MOVPE
- 1 December 2000
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 221 (1-4) , 334-337
- https://doi.org/10.1016/s0022-0248(00)00709-0
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Lateral epitaxy of low defect density GaN layers via organometallic vapor phase epitaxyApplied Physics Letters, 1997
- Anisotropic epitaxial lateral growth in GaN selective area epitaxyApplied Physics Letters, 1997
- Thick GaN Epitaxial Growth with Low Dislocation Density by Hydride Vapor Phase EpitaxyJapanese Journal of Applied Physics, 1997