High resolution 100kV electron beam lithography in SU-8
- 20 February 2006
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 83 (4-9) , 1609-1612
- https://doi.org/10.1016/j.mee.2006.01.142
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Microfabricated solid-state dye lasers based on a photodefinable polymerApplied Optics, 2005
- Fabrication of robust 2-D and 3-D microfluidic networks for lab-on-a-chip bioassaysJournal of Microelectromechanical Systems, 2005
- Nanoscale silicon structures by using carbon nanotubes as reactive ion etch masksNanotechnology, 2005
- Fully integrated optical systems for lab-on-a-chip applicationsPublished by SPIE-Intl Soc Optical Eng ,2005
- The dynamics of genomic-length DNA molecules in 100-nm channelsProceedings of the National Academy of Sciences, 2004
- Exploring the high sensitivity of SU-8 resist for high resolution electron beam patterningMicroelectronic Engineering, 2004
- PMMA to SU-8 bonding for polymer based lab-on-a-chip systems with integrated opticsJournal of Micromechanics and Microengineering, 2004
- High-resolution pattern generation using the epoxy novolak SU-8 2000 resist by electron beam lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003
- Characterization of SU-8 as a photoresist for electron-beam lithographyPublished by SPIE-Intl Soc Optical Eng ,2003
- Micromachining applications of a high resolution ultrathick photoresistJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995