High-resolution pattern generation using the epoxy novolak SU-8 2000 resist by electron beam lithography
- 1 July 2003
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 21 (4) , L5-L7
- https://doi.org/10.1116/1.1596216
Abstract
No abstract availableKeywords
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