Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS
Top Cited Papers
- 30 November 2000
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 11 (1) , 20-26
- https://doi.org/10.1088/0960-1317/11/1/304
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMSSensors and Actuators A: Physical, 1998
- Micromachining applications of a high resolution ultrathick photoresistJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995