X-ray photoelectron study of TiN/SiO2 and TiN/Si interfaces
- 1 October 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 266 (2) , 298-301
- https://doi.org/10.1016/0040-6090(95)06651-9
Abstract
No abstract availableKeywords
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