Activation energy for CoSi and CoSi2 formation measured during rapid thermal annealing
- 15 January 1995
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 77 (2) , 614-619
- https://doi.org/10.1063/1.359046
Abstract
The activation energies, Ea’s, for CoSi and CoSi2 formation were determined using in situ resistance measurements during rapid thermal annealing. Co films were evaporated on undoped polycrystalline Si (poly-Si) and single-crystal Si on sapphire (SOS) substrates. The resistance was monitored for heating rates from 1 to 60 °C/s up to 900 °C. There was significant thermal lag between the samples and thermocouple embedded in the susceptor wafer for heating rates greater than 20 °C/s. The thermal lag was quantified by melting Au-Si, Al-Si, and Ag-Si eutectics, and shown to be consistent with finite element modeling. The Ea’s determined from Kissinger plots for heating rates ≤20 °C/s were 2.09±0.11 and 2.03±0.08 eV for CoSi formation and 2.91±0.22 and 2.81±0.23 eV for CoSi2 formation, for Co/poly-Si and Co/SOS samples, respectively.This publication has 16 references indexed in Scilit:
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