Rapid thermal annealing of WSix
- 1 November 1991
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 53, 219-223
- https://doi.org/10.1016/0169-4332(91)90266-m
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Metastable phase formation in tungsten-silicon thin filmsJournal of Non-Crystalline Solids, 1988
- Cr75Si25 thin films—Temperature dependence of electrical properties and microstructureActa Metallurgica, 1986
- Analysis of the effects of annealing on resistivity of chemical vapor deposition tungsten–silicide filmsJournal of Applied Physics, 1986
- Properties of tungsten silicide film on polycrystalline siliconJournal of Applied Physics, 1981
- Oxidation mechanisms in WSi2 thin filmsApplied Physics Letters, 1978
- Kinetic analysis of derivative curves in thermal analysisJournal of Thermal Analysis and Calorimetry, 1970