Trends in Wafer Cleaning Technology

Publisher Website

1 January 1998

book chapter
Published by Springer Nature

p. 437-450
https://doi.org/10.1007/978-3-662-03535-1_32

Abstract

No abstract available

Keywords

This publication has 6 references indexed in Scilit:

Influence of initial wafer cleanliness on metal removal efficiency in immersion SC-1 cleaning: limitation of immersion-type wet cleaning
IEEE Transactions on Semiconductor Manufacturing, 1998
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