Optical properties of amorphous carbon films formed by r.f. plasma deposition from methane
- 1 November 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 192 (2) , 201-209
- https://doi.org/10.1016/0040-6090(90)90065-l
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- The role of hydrogen in vapor deposition of diamondJournal of Applied Physics, 1989
- Optical absorption and hydrogen content of plasma- deposited carbon filmsThin Solid Films, 1988
- Amorphous carbonAdvances in Physics, 1986
- Pulsed high rate plasma etching with variable Si/SiO2 selectivity and variable Si etch profilesApplied Physics Letters, 1985
- Diagnostics and modelling of a methane plasma used in the chemical vapour deposition of amorphous carbon filmsJournal of Physics D: Applied Physics, 1984
- The deposition of thin films of materials with high melting points on substrates at room temperature using the pulse plasma methodThin Solid Films, 1981
- Properties of polycrystalline silicon prepared by chemical transport in hydrogen plasma at temperatures between 80 and 400 degrees CJournal of Physics C: Solid State Physics, 1981
- Properties and coating rates of diamond-like carbon films produced by R.F. glow discharge of hydrocarbon gasesThin Solid Films, 1979
- Crystallization from a reactive pulse plasmaJournal of Crystal Growth, 1977
- Electronic properties of substitutionally doped amorphous Si and GePhilosophical Magazine, 1976