Effect of H2 Plasma Etching during Glow-Discharge Deposition of Amorphous Carbon Films
- 1 April 1986
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 25 (4R)
- https://doi.org/10.1143/jjap.25.511
Abstract
Amorphous carbon films were prepared by the glow-discharge decomposition of C2H2, C2H4, and C2F6 at various rf powers and substrate temperatures (T s). The deposition rate (DR) of a-C:H and a-C:H:F decreases with increase in T s. These results are discussed in terms of the H-plasma etching of a-C:H films during the deposition. The optical, electrical and structural properties of the a-C:H films are also examined as a function of the rf power.Keywords
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