On reactively sputtered Ti-Al-V carbonitrides
- 1 December 1988
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 36 (1-2) , 265-273
- https://doi.org/10.1016/0257-8972(88)90156-9
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminumJournal of Vacuum Science & Technology A, 1987
- Titanium aluminum nitride films: A new alternative to TiN coatingsJournal of Vacuum Science & Technology A, 1986
- On structure and properties of sputtered Ti and Al based hard compound filmsJournal of Vacuum Science & Technology A, 1986
- Möglichkeiten und Grenzen einer gezielten Stoffauswahl für verschleißfeste HartstoffschichtenMaterialwissenschaft und Werkstofftechnik, 1986