On the properties of physically vapour-deposited Ti-Al-V-N coatings
- 1 October 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 153 (1-3) , 83-90
- https://doi.org/10.1016/0040-6090(87)90172-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Titanium aluminum nitride films: A new alternative to TiN coatingsJournal of Vacuum Science & Technology A, 1986
- On structure and properties of sputtered Ti and Al based hard compound filmsJournal of Vacuum Science & Technology A, 1986
- A high rate sputtering process for the formation of hard friction-reducing TiN coatings on toolsThin Solid Films, 1982