Stability Analysis of Cr-MIS Solar Cells
- 1 August 1982
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Reliability
- Vol. R-31 (3) , 276-280
- https://doi.org/10.1109/TR.1982.5221337
Abstract
The 50 Å Cu/30 Å Cr/20 Å SiO,/Si solar cell structure has been analyzed by Auger, ESCA and ellipsometer measurements. An oxidation-reduction failure mechanism has been proposed for shelf-life degradation, and experimental evidence for such behavior is presented. The effect of this degradation is a decrease in the oxide thickness at the interface bringing about a photovoltaic performance degradation. The performance degradation involves a typical change in Voc, from about 0.55 V to 0.52 V with little or no change in Jsc or fill factor. The performance of all Cr-MIS devices then stabilizes when a thermodynamic equilibrium is attained. The light-effect degradation is more complex and the rearrangement of bonding in the interface oxide and at the SiOx/Si interface might reduce the rate of degradation. The Cr-MIS solar cell should be designed with an oxide thickness more than the static optimum value to allow for a decrease in oxide thickness to the optimum value.Keywords
This publication has 5 references indexed in Scilit:
- An evaluation of potentially low-cost silicon substrates for metal-insulator-semiconductor solar cellsJournal of Applied Physics, 1981
- A revised process to increase efficiency and reproducibility in Cr-MIS solar cellsIEEE Electron Device Letters, 1980
- Reliability studies on MIS solar cellsApplied Physics A, 1978
- Barrier height modification in silicon Schottky (MIS) solar cellsIEEE Transactions on Electron Devices, 1977
- Studies of tunnel MOS diodes I. Interface effects in silicon Schottky diodesJournal of Physics D: Applied Physics, 1971