Electrical and reliability properties of PZT thin films for ULSI DRAM applications
- 1 November 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
- Vol. 38 (6) , 690-703
- https://doi.org/10.1109/58.108871
Abstract
The electrical and reliability characteristics of ferroelectric capacitors fabricated using sol-gel derived 50/50 lead-zirconate-titanate (PZT) thin films have been examined for ULSI DRAM (dynamic random access memory) applications. Various electrode materials, film thicknesses (200 nm to 600 nm) and capacitor areas were used. A large stored-energy density (Q/sub c/) of 15 mu C/cm/sup 2/ (at 125 kV/cm) was measured using different methods. The results indicate that PZT thin films exhibit material properties which might satisfy the requirements of ULSI DRAMs.< >Keywords
This publication has 24 references indexed in Scilit:
- Scaling Properties in the Electrical and Reliability Characteristics of Lead-Zirconate-Titanate (PZT) Ferroelectric Thin Film CapacitorsMRS Proceedings, 1990
- Microstructure and domain effects in ferroelectric ceramicsFerroelectrics, 1989
- Memory cell and technology issues for 64- and 256-Mbit one-transistor cell MOSD DRAMsProceedings of the IEEE, 1989
- Switching kinetics of lead zirconate titanate submicron thin-film memoriesJournal of Applied Physics, 1988
- The DC resistivity of modified PZT ceramicsJournal of Physics C: Solid State Physics, 1983
- The distribution of vacancies in lanthana-doped lead titanatePhysica Status Solidi (a), 1970
- Nucleation and Growth of Ferroelectric Domains in BaTiO3 at Fields from 2 to 450 kV/cmJournal of Applied Physics, 1963
- Theoretical Considerations on the Switching Transient in FerroelectricsPhysical Review B, 1962
- Dynamic Behavior of Domain Walls in Barium TitanatePhysical Review B, 1955
- Domain Formation and Domain Wall Motions in Ferroelectric BaTiSingle CrystalsPhysical Review B, 1954