Chemical states study of Si in SiOx films grown by PECVD
- 1 October 1986
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 26 (4) , 575-583
- https://doi.org/10.1016/0169-4332(86)90128-5
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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