Characterization of Ar/Cu electron-cyclotron-resonance plasmas using optical emission spectroscopy
- 1 September 1996
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 80 (5) , 2605-2613
- https://doi.org/10.1063/1.363177
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Permanent magnet electron cyclotron resonance plasma source with remote windowJournal of Vacuum Science & Technology A, 1995
- Metal ion deposition from ionized mangetron sputtering dischargeJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Copper deposition by electron cyclotron resonance plasmaJournal of Vacuum Science & Technology A, 1993
- Doppler shift measurements of ion energy distribution widths in an electron cyclotron resonance/multipole hybrid reactorJournal of Vacuum Science & Technology A, 1992
- Plasma uniformity and power deposition in electron cyclotron resonance etch toolsJournal of Vacuum Science & Technology A, 1992
- Determination of electron temperature in ion plating discharges by optical emission spectroscopyVacuum, 1991
- Ion and neutral temperatures in electron cyclotron resonance plasma reactorsApplied Physics Letters, 1991
- Behavior of Ar plasmas formed in a mirror field electron cyclotron resonance microwave ion sourceJournal of Vacuum Science & Technology A, 1990
- Potential applications of an electron cyclotron resonance multicusp plasma sourceJournal of Vacuum Science & Technology A, 1990
- Microwave plasma: its characteristics and applications in thin film technologyVacuum, 1986