A simple model of the dose dependence of resistance in ion-bombarded thin films
- 1 November 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 55 (1) , 61-66
- https://doi.org/10.1016/0040-6090(78)90074-3
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Properties and applications of ion-implanted filmsThin Solid Films, 1978
- Changes in the phase structure and formation of chemical compounds by ion implantation of tantalum thin filmsThin Solid Films, 1976
- Reactive ion bombardment of tantalum thin film resistorsThin Solid Films, 1973