Reactive ion bombardment of tantalum thin film resistors
- 1 July 1973
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 17 (1) , 59-66
- https://doi.org/10.1016/0040-6090(73)90005-9
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Tantalum thin film resistorsThin Solid Films, 1972
- Tantalum Films Triode-Sputtered in Mixtures of Argon and Water VaporJournal of Vacuum Science and Technology, 1972
- Reactivity sputtered tantalum thin film resistors Part 1. Physical and electrical propertiesThin Solid Films, 1971
- Use of low-energy accelerators for ion implantationNuclear Instruments and Methods, 1971
- Ion-bombardment-induced resistivity changes in thin films of silver, gold, titanium, and tungstenCanadian Journal of Physics, 1968
- Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum FilmsJournal of Applied Physics, 1964