R.F. sputtered β-tantalum and b.c.c. tantalum films
- 1 October 1972
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 12 (2) , 313-317
- https://doi.org/10.1016/0040-6090(72)90095-8
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Phases Observed in Oxygen-Reactive Sputtering of TantalumApplied Physics Letters, 1971
- A very pure thin film tantalum phaseThin Solid Films, 1971
- Structural and Electrical Properties of Tantalum Films Sputtered in Oxygen-Argon MixturesJournal of Applied Physics, 1971
- R.f. sputtered tantalum films deposited in an oxygen doped atmosphereThin Solid Films, 1970
- Phase composition and conductivity of sputtered tantalumThin Solid Films, 1970
- Structure and properties of r.f. sputtered, superconducting tantalum filmsThin Solid Films, 1970
- Effect of Background-Gas Impurities on the Formation of Sputtered β-Tantalum FilmsJournal of Applied Physics, 1967
- A NEW STRUCTURE IN TANTALUM THIN FILMSApplied Physics Letters, 1965
- Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum FilmsJournal of Applied Physics, 1964