Subfemtojoule deep submicrometer-gate CMOS built in ultra-thin Si film on SIMOX substrates
- 1 January 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 38 (2) , 373-377
- https://doi.org/10.1109/16.69919
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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