Diffusion studies in Cr-Pt thin films using Auger electron spectroscopy
- 1 February 1975
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 25 (2) , 483-489
- https://doi.org/10.1016/0040-6090(75)90066-8
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- Interdiffusion and compound formation in Ta–Au thin-film couplesJournal of Applied Physics, 1974
- The preparation and properties of elemental semiconductor thin filmsThin Solid Films, 1973
- Diffusion studies in Au-Ni thin eilm couples using optical reflectivity techniqueJournal of Electronic Materials, 1973
- Self-Diffusion along Dislocations in Single-Crystal Au FilmsPhysical Review B, 1973
- Silicon diffusion through thin tungsten films on silicon, studied with Auger spectroscopyJournal of Electron Spectroscopy and Related Phenomena, 1973
- Diffusion measurements in thin films utilizing work function changes: Cr into AuJournal of Applied Physics, 1972
- Diffusion in Thin Film Ti–Au, Ti–Pd, and Ti–Pt CouplesJournal of Vacuum Science and Technology, 1972
- LOW-TEMPERATURE MIGRATION OF SILICON IN THIN LAYERS OF GOLD AND PLATINUMApplied Physics Letters, 1971
- Diffusion in evaporated films of gold-aluminiumPhilosophical Magazine, 1962
- Die optische Untersuchung der Diffusion von Metallen ineinanderThe European Physical Journal A, 1955