Three-dimensional process simulation
- 1 December 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 34 (1) , 85-100
- https://doi.org/10.1016/s0167-9317(96)00011-1
Abstract
No abstract availableKeywords
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- Simulation of the step coverage for chemical vapor deposited silicon dioxideJournal of Applied Physics, 1992
- Simulation of lithographic images and resist profilesMicroelectronic Engineering, 1990
- Models for implantation into multilayer targetsApplied Physics A, 1986