Departure from a stablephase on Si(111)
- 15 March 1982
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 25 (6) , 4327-4330
- https://doi.org/10.1103/physrevb.25.4327
Abstract
A combined ultraviolet-photoemission- (UPS) and Auger-electron-spectroscopy investigation on the interaction of atomic hydrogen with the Si(111) surface shows that for high H exposures [> L (L = Torr sec)] coadsorbed oxygen impurities build up at substrate temperatures below 200°C. The oxygen contamination gives rise to a UPS spectrum which is virtually identical with the spectra so far attributed to a stable (up to 700°C) phase under similar experimental conditions.
Keywords
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