Properties of NbN Films Prepared by Reactive Magnetron Sputtering
- 16 May 1993
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 137 (1) , K25-K28
- https://doi.org/10.1002/pssa.2211370132
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- High-temperature annealing characteristics of tungsten and tungsten nitride Schottky contacts to GaAs under different annealing conditionsJournal of Applied Physics, 1988
- Effects of thermal annealing on superconducting Nb and NbN filmsJournal of Vacuum Science & Technology A, 1988
- The effect of the deposition rate on the properties of d.c.-magnetron-sputtered niobium nitride thin filmsThin Solid Films, 1987
- Comparison of low temperature and high temperature refractory metal/silicides self-aligned gate on GaAsJournal of Vacuum Science & Technology B, 1986