Tight-binding model for hydrogen-silicon interactions
- 15 March 1992
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 45 (12) , 6839-6843
- https://doi.org/10.1103/physrevb.45.6839
Abstract
We have developed an empirical tight-binding model for use in molecular-dynamics simulations to study hydrogen-silicon systems. The hydrogen-silicon interaction is constructed to reproduce the electronic energy levels and vibration frequencies of silane (). Further use of the model in the studies of disilane ( ) and of hydrogen on the Si(111) surface also yields results in good agreement with first-principles calculations and experiments.
Keywords
This publication has 45 references indexed in Scilit:
- Ideal hydrogen termination of the Si (111) surfaceApplied Physics Letters, 1990
- Hydrogen bonding and diffusion in crystalline siliconPhysical Review B, 1989
- Theory of hydrogen diffusion and reactions in crystalline siliconPhysical Review B, 1989
- Theory of Hydrogen Diffusion and Reactions in Crystalline SiliconPhysical Review Letters, 1988
- Theory of hydrogen passivation of shallow-level dopants in crystalline siliconPhysical Review Letters, 1988
- Surfaces of siliconReports on Progress in Physics, 1987
- Hydrogen in crystalline semiconductorsApplied Physics A, 1987
- Unusually Low Surface-Recombination Velocity on Silicon and Germanium SurfacesPhysical Review Letters, 1986
- Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopyApplied Physics A, 1986
- Formation of SiH bonds on the surface of microcrystalline silicon covered with SiOx by HF treatmentSolid State Communications, 1984