High field conduction processes in silicon nitride films in the presence of charge trapping
- 1 July 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 36 (1) , 157-160
- https://doi.org/10.1016/0040-6090(76)90428-4
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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- Hopping conduction in amorphous solidsPhilosophical Magazine, 1971
- On the hysteresis and memory properties of the silicon-silicon nitride systemSolid-State Electronics, 1971
- The Poole-Frenkel Effect with Compensation PresentJournal of Applied Physics, 1968
- Electrical Characteristics of Silicon Nitride Films Prepared by Silane‐Ammonia ReactionJournal of the Electrochemical Society, 1968
- Current Transport and Maximum Dielectric Strength of Silicon Nitride FilmsJournal of Applied Physics, 1967