Formation of ZnGa2Se4Epitaxial Layer during Molecular Beam Epitaxial Growth of Ga2Se3on ZnSe

Abstract
Epitaxial ZnGa2Se4 films were successfully grown on (100)GaAs substrates for the first time. When Ga2Se3/ZnSe heterostructures were prepared on (100)GaAs by molecular beam epitaxy (MBE), a ZnGa2Se4 epitaxial layer was obtained at temperatures above 540° C. The electron diffraction and Raman spectra revealed that the c-axis-oriented ZnGa2Se4 epitaxial film with a defect chalcopyrite structure was formed during the MBE growth of Ga2Se3 on ZnSe. Furthermore, a broad emission peak centered around 670 nm was observed in epitaxial ZnGa2Se4 film in low-temperature photoluminescence measurements.