High-quality a–Si:H grown at high rate using an expanding thermal plasma
- 1 December 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 97 (1-3) , 719-722
- https://doi.org/10.1016/s0257-8972(97)00329-0
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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