Kinetics and Mechanism of the C49 to C54 Titanium Disilicide Polymorphic Transformation
- 1 January 1993
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Nucleation and growth in the initial stage of metastable titanium disilicide formationJournal of Applied Physics, 1993
- Activation energy for the C49-to-C54 phase transition of polycrystalline TiSi2 films with arsenic impuritiesApplied Physics Letters, 1993
- Effects of Sb on phase transformations of amorphous TiSi2 thin filmsJournal of Applied Physics, 1992
- Phase formation in the interfacial reactions of ultrahigh vacuum deposited titanium thin films on (111)SiJournal of Applied Physics, 1992
- Reactions at the Titanium-Silicon Interface Studied Using Hot-Stage TemMRS Proceedings, 1992
- In-Situ Studies of the Formation Sequence of Silicides During Vacuum (10-7 TORR)Thermal Annealing of TI/Polysilicon BilayersMRS Proceedings, 1991
- Effect of a substrate on the phase transformations of amorphous TiSi2 thin filmsJournal of Applied Physics, 1987
- Metastable phase formation in titanium-silicon thin filmsJournal of Applied Physics, 1985
- The kinetics of grain boundary nucleated reactionsActa Metallurgica, 1956
- The influence of grain boundaries on the nucleation of secondary phasesActa Metallurgica, 1955