Deposition of TiO2 thin films by plasma-enhanced decomposition of tetraisopropyltitanate
- 1 June 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 201 (2) , 327-335
- https://doi.org/10.1016/0040-6090(91)90121-d
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
- Effects of Small Amount of Water on Physical and Electrical Properties of TiO2 Films Deposited by CVD MethodJournal of the Electrochemical Society, 1988
- Plasma enhanced chemical vapor deposition: Differences between direct and remote plasma excitationJournal of Vacuum Science & Technology A, 1987
- Summary Abstract: Low-temperature deposition of optical coatings using assisted deposition techniquesJournal of Vacuum Science & Technology A, 1987
- Chemical vapor deposition of doped TiO2 thin filmsThin Solid Films, 1987
- Ion-based methods for optical thin film depositionJournal of Materials Science, 1986
- Properties of TiO_2 and SiO_2 thin films deposited using ion assisted depositionApplied Optics, 1985
- Indirect plasma deposition of silicon dioxideJournal of Vacuum Science and Technology, 1982
- Characterization of optical thin filmsApplied Optics, 1979
- TiO2 Antireflection Coatings by a Low Temperature Spray ProcessJournal of the Electrochemical Society, 1978
- TiO[sub 2] Film Properties as a Function of Processing TemperatureJournal of the Electrochemical Society, 1972