High-speed laser chemical vapor deposition of copper: A search for optimum conditions
- 15 March 1989
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 65 (6) , 2470-2474
- https://doi.org/10.1063/1.342817
Abstract
The photothermal laser-induced chemical vapor deposition of copper is studied as a function of the writing speed, the light intensity, and the diameter of the focal spot on the substrate, at three different pressures of the copperbishexafluoroacetylacetonate precursor. The height, the width, and the electrical conductivity of the deposited metal stripes are measured. The metalorganic vapor pressure is the key variable for attaining high writing speeds. Copper stripes have been obtained at 1 mm s−1 .This publication has 9 references indexed in Scilit:
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