Shape Transition of GaAs Islands Grown on InAs (001) Surfaces
- 1 March 1994
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 33 (3B) , L470
- https://doi.org/10.1143/jjap.33.l470
Abstract
We have observed the shape transition of three-dimensional (3D) GaAs islands grown on InAs (001) surfaces with increasing the GaAs deposition. A scanning tunneling microscopy image of a 1.0 monolayer (ML) GaAs-deposited on InAs surface showed 3D island formation with an island size of about 10 nm×20∼30 nm, extending in the [11̄0] direction. When 2.0 ML GaAs was deposited onto the InAs surface, this island shape changed to a compact, pyramid-like one. At this stage, smaller islands were formed on the InAs substrate surface, which was reconstructed to be an In-stabilized (4×2) structure. These islands coalesced and grew larger on the InAs substrate surface with increasing the amount of GaAs deposition.Keywords
This publication has 7 references indexed in Scilit:
- Multi-chamber Ultrahigh Vacuum Scanning Tunneling Microscope System for Investigating Processed GaAs Surfaces and Observation of Argon-Ion-Bombarded GaAs SurfacesJapanese Journal of Applied Physics, 1993
- Growth of CoAl/AlAs/GaAs metal/ semiconductor heterostructures by molecular beam epitaxySurface Science, 1992
- Scanning tunneling microscopy of GaAs-on-InP heteroepitaxial growthUltramicroscopy, 1992
- A Model for Strain-Induced Roughening and Coherent Island GrowthEurophysics Letters, 1992
- Effect of strain on surface morphology in highly strained InGaAs filmsPhysical Review Letters, 1991
- Gallium arsenide and other compound semiconductors on siliconJournal of Applied Physics, 1990
- Long-wavelength PINFET receiver OEIC on a GaAs-on-InP heterostructureElectronics Letters, 1987