Methodology for determining the radiation efficiency and contrast characteristics in the case of electron and ion lithography, using positive polymer resists
- 15 May 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 200 (2) , 353-362
- https://doi.org/10.1016/0040-6090(91)90207-e
Abstract
No abstract availableKeywords
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