A Study of the Crystallographic and Luminescent Characteristics of ZnS:Mn Films Prepared by an RF Magnetron Sputtering Method for AC Thin-Film Electroluminescent Devices

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Abstract
Characteristics of ZnS:Mn films prepared by an rf sputtering method for electroluminescent devices were examined in detail; the features were clarified by a comparison with films produced by an electron-beam method. It was found that the incident species to the substrate during sputtering were composed of ZnS, Zn2, Zn2S, MnS and ZnMn in addition to Zn and S atoms; in the case of the electron-beam method, they were composed of Zn and S2. We confirmed that preparative, crystallographic, microstructural , chemical, and eventually electroluminescent characteristics in sputtered ZnS:Mn films were different from those in electron-beam films, according to the fundamental difference of the incident species to the substrate, which affected film growth.