Ge segregation tested by X-ray photoelectron diffraction and surface atom titration during the first stage of Si heteroepitaxy on Ge(001)2 × 1
- 1 May 1996
- journal article
- Published by Elsevier in Surface Science
- Vol. 352-354, 634-640
- https://doi.org/10.1016/0039-6028(95)01218-4
Abstract
No abstract availableKeywords
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