Experimental and thermodynamical investigation of selective low pressure chemical vapour deposition of tungsten using WCl6 as tungsten source
- 1 September 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 176 (2) , 263-276
- https://doi.org/10.1016/0040-6090(89)90099-0
Abstract
No abstract availableKeywords
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