Stabilization of sputtered β-tantalum by a tantalum silicide interlayer
- 1 March 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 66 (2) , 191-196
- https://doi.org/10.1016/0040-6090(80)90222-9
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- UHV – Deposited Amorphous Tantalum and Tantalum–Nickel FilmsActive and Passive Electronic Components, 1977
- Factors controlling the structure of sputtered Ta filmsThin Solid Films, 1973
- In situ reflection high energy electron diffraction study of the nucleation and growth of tantalum filmsThin Solid Films, 1973