Analysis of the Metallic Phase of Two-Dimensional Holes in SiGe in Terms of Temperature Dependent Screening
- 13 November 2000
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 85 (20) , 4357-4360
- https://doi.org/10.1103/physrevlett.85.4357
Abstract
We find that temperature dependent screening can quantitatively explain the metallic behavior of the resistivity on the metallic side of the so-called metal-insulator transition in -SiGe. Interference and interaction effects exhibit the usual insulating behavior which is expected to overpower the metallic background at sufficiently low temperatures. We find empirically that the concept of a Fermi liquid describes our system with its large interaction parameter .
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This publication has 40 references indexed in Scilit:
- Magnetoresistance in Si metal-oxide-semiconductor field-effect transitors: Evidence of weak localization and correlationPhysical Review B, 1982
- Magnetoconductance and weak localization in silicon inversion layersPhysical Review B, 1981
- Magnetic delocalisation of a two-dimensional electron gas and the quantum law of electron-electron scatteringJournal of Physics C: Solid State Physics, 1981
- Observation of a Non-Ohmic Hall Resistivity at Low Temperatures in a Two-Dimensional Electron GasPhysical Review Letters, 1981
- Experimental study of localization in thin wiresPhysical Review B, 1980
- Nonmetallic Conduction in Electron Inversion Layers at Low TemperaturesPhysical Review Letters, 1980
- Negative Magnetoresistance in Silicon (100) MOS Inversion LayersJournal of the Physics Society Japan, 1980
- Nonmetallic Conduction in Thin Metal Films at Low TemperaturesPhysical Review Letters, 1979
- Scaling Theory of Localization: Absence of Quantum Diffusion in Two DimensionsPhysical Review Letters, 1979
- Absence of Diffusion in Certain Random LatticesPhysical Review B, 1958