Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films
- 29 January 1999
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 111 (2-3) , 163-171
- https://doi.org/10.1016/s0257-8972(98)00727-0
Abstract
No abstract availableThis publication has 28 references indexed in Scilit:
- Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substratesSurface and Coatings Technology, 1998
- Microstructure of SnO2 Conductive Film Prepared by Pyrohydrolytic Decomposition onto a Glass SubstrateJapanese Journal of Applied Physics, 1988
- Stoichiometry control mechanisms for bias-sputtered zinc-oxide thin filmsCanadian Journal of Physics, 1985
- Thin metallic oxides as transparent conductorsThin Solid Films, 1982
- Heat mirror coatings for energy conserving windowsSolar Energy Materials, 1981
- Formation of transparent heat mirrors by ion plating onto ambient temperature substratesThin Solid Films, 1979
- Chemical Vapor Deposition of Antimony‐Doped Tin Oxide Films Formed from Dibutyl Tin DiacetateJournal of the Electrochemical Society, 1976
- Theory of Photoconductivity in Semiconductor FilmsPhysical Review B, 1956
- Note on the Hall Potential Across an Inhomogeneous ConductorPhysical Review B, 1950
- The tension of metallic films deposited by electrolysisProceedings of the Royal Society of London. Series A, Containing Papers of a Mathematical and Physical Character, 1909