Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates
- 1 February 1998
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 99 (1-2) , 147-160
- https://doi.org/10.1016/s0257-8972(97)00436-2
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Improved ion beam deposition system with RF sputter-type ion sourceNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1997
- Ion plating as an industrial manufacturing methodJournal of Vacuum Science & Technology A, 1992
- Characterization of TiN films deposited using multicathode unbalanced magnetronsJournal of Vacuum Science & Technology A, 1992
- Voltage-controlled DC reactive magnetron sputtering of indium-doped zinc oxide filmsJournal of Physics D: Applied Physics, 1992
- The formation and control of direct current magnetron discharges for the high-rate reactive processing of thin filmsJournal of Vacuum Science & Technology A, 1989
- Pressure stability in reactive magnetron sputteringThin Solid Films, 1988
- Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputteringThin Solid Films, 1984
- Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target modeThin Solid Films, 1984
- Composition control in conducting oxide thin filmsThin Solid Films, 1982
- The Hall effect in polycrystalline and powdered semiconductorsReports on Progress in Physics, 1980