Mechanism of polishing of SiO2 films by CeO2 particles
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- 1 May 2001
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 283 (1-3) , 129-136
- https://doi.org/10.1016/s0022-3093(01)00364-7
Abstract
No abstract availableKeywords
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