The effect of the deposition rate on the electrical resistivity of thin tin films
- 1 April 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 78 (3) , 299-302
- https://doi.org/10.1016/0040-6090(89)90597-x
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- The effect of deposition rate on the electrical resistivity of thin manganese filmsJournal of Physics D: Applied Physics, 1980
- The temperature dependence of resistance in aggregate tin filmsJournal of Applied Physics, 1977
- Resistivity and temperature coefficient of resistivity of tin filmsJournal of Materials Science, 1977
- Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External SurfacesPhysical Review B, 1970
- Der elektrische Widerstand dünner Zinnschichten mit GitterstörungenThe European Physical Journal A, 1952