Characterization of P- and N-Type Impurity Diffusions in GaAs from Doped Silica Films

Abstract
Characteristics of p- and n-type open-tube diffusion into GaAs using zinc (Zn)- and tin (Sn)-doped spin-on silica films are investigated. This paper first describes the difference of carrier concentration profiles between both types of diffusion, and then interstitial-substitutional diffusion mechanisms are proposed. Next, the surface condition after diffusion is observed by SEM and AFM. In the case of using highly doped films, abundant surface defects are detected. However, the surface condition is greatly improved by using low-doped ones. Also, the two micrographs are in good agreement. Finally, lateral diffusion length and electrical characteristics of diffused layers are discussed. It is concluded that this diffusion method is quite simple and useful for the fabrication of III-V compound semiconductor devices.

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