Atomic layer doping of SiGe by low pressure (rapid thermal) chemical vapor deposition
- 1 February 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 294 (1-2) , 15-17
- https://doi.org/10.1016/s0040-6090(96)09461-8
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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