Plasma oxidation of polymers
- 1 December 1986
- journal article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 6 (4) , 401-416
- https://doi.org/10.1007/bf00565552
Abstract
No abstract availableKeywords
This publication has 26 references indexed in Scilit:
- Oxygen RIE‐Resistant Deep‐UV Positive Resists: Poly (trimethylsilylmethyl methacrylate) and Poly (trimethylsilylmethyl methacrylate‐co‐3‐oximo‐2‐butanone methacrylate)Journal of the Electrochemical Society, 1985
- Reactions of di-, tri-, and hexamethylbenzenes with oxygen(3P) atoms in liquid and on adsorbed phasesJournal of the American Chemical Society, 1985
- DIRECT HYDROXYLATION OF AROMATIC COMPOUNDS IN AN RF PLASMAChemistry Letters, 1982
- Structural Composition of Polymers Relative to Their Plasma Etch CharacteristicsJournal of the Electrochemical Society, 1982
- Organosilicon monomers for plasma-developed x-ray resistsJournal of Vacuum Science and Technology, 1981
- Oxygen Atoms Produced by Microwave Discharge: Reaction with ArenesAngewandte Chemie International Edition in English, 1980
- Spectroscopic Study of Radiofrequency Oxygen Plasma Stripping of Negative Photoresists. I. Ultraviolet SpectrumApplied Spectroscopy, 1976
- Reaction of oxygen(3P) atoms with toluene and 1-methylcyclohexeneJournal of the American Chemical Society, 1976
- Relative rate constants for the reaction of ground-state oxygen atoms with partly fluorinated propylenes and butenesTransactions of the Faraday Society, 1969
- The thermal degradation of polyvinyl compounds. I. A new type of molecular stillProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1949