Comparison of back-scattering parameters using high energy oxygen and helium ions
- 1 December 1973
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 19 (1) , 157-164
- https://doi.org/10.1016/0040-6090(73)90032-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Analysis of amorphous layers on silicon by backscattering and channeling effect measurementsSurface Science, 1970
- Range and stopping-power tables for heavy ionsAtomic Data and Nuclear Data Tables, 1970
- Pulse Height Defect and Energy Dispersion in Semiconductor DetectorsReview of Scientific Instruments, 1966