Strain relaxation in epitaxial Si1−xGex/Si(100) layers induced by reaction with palladium
- 1 December 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 222 (1-2) , 157-160
- https://doi.org/10.1016/0040-6090(92)90059-k
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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