A heavy negative ion sputter source: Production mechanism of negative ions and their applications
- 1 February 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 37-38, 38-44
- https://doi.org/10.1016/0168-583x(89)90133-x
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Transparent carbon film prepared by mass-separated negative-carbon-ion-beam depositionJournal of Applied Physics, 1987
- Negative ion source (NIABNIS) and preparation of transparent carbon films by negative carbon ion beam depositionNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- Neutral and ionized alkaline metal bombardment type heavy negative ion source (NIABNIS)Vacuum, 1986
- Semi-empimcal mathematical relationships for electropositive adsorbate induced work function changesSurface Science, 1986
- Mass-separated negative-ion-beam deposition systemReview of Scientific Instruments, 1986
- Neutral and ionized alkaline metal bombardment type heavy negative-ion source (NIABNIS)Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1984
- Axial magnetic field extraction-type microwave ion source with a permanent magnetReview of Scientific Instruments, 1984
- Theoretical models of the negative ionization of hydrogen on clean tungsten, cesiated tungsten and cesium surfaces at low energiesSurface Science, 1982
- The theoretical and experimental study of the ionization processes during the low energy ion sputteringSurface Science, 1974
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969